Euroasian Journal of Semiconductors Science and Engineering
Abstract
The paper presents the results of the development of a method and means of measuring the contact potential difference based on the analysis of the compensation dependence of the Kelvin probe (non-compensation technique). The method is implemented in a digital Kelvin probe and used for non-destructive contactless testing of semiconductor wafers based on characteristics of spatial distribution of electron work function.
Recommended Citation
Panteleev, K.; Zharin, A.; Mikitsevich, V.; and Gusev, O.
(2020)
"SEMICONDUCTOR WAFERS TESTING BASED ON ELECTRON WORK FUNCTION OF SURFACE,"
Euroasian Journal of Semiconductors Science and Engineering: Vol. 2:
Iss.
5, Article 2.
Available at:
https://uzjournals.edu.uz/semiconductors/vol2/iss5/2
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