The paper presents the results of the development of the method and means of photostimulated scanning electrometry for non-destructive contactless testing of the uniformity of spatial distribution of semiconductor wafers ion-doped and diffusion layers’ parameters.
Tyavlovsky, Andrei; Zharin, Anatoly; Mikitsevich, Uladzimir; and Vorobey, Roman
"SCANNING PHOTOSTIMULATED ELECTROMETRY FOR TESTING THE UNIFORMITY OF SPATIAL DISTRIBUTION OF SEMICONDUCTOR WAFERS PARAMETERS,"
Euroasian Journal of Semiconductors Science and Engineering: Vol. 2
, Article 11.
Available at: https://uzjournals.edu.uz/semiconductors/vol2/iss4/11