Euroasian Journal of Semiconductors Science and Engineering
Article Title
Abstract
The paper presents the results of the development of the method and means of photostimulated scanning electrometry for non-destructive contactless testing of the uniformity of spatial distribution of semiconductor wafers ion-doped and diffusion layers’ parameters.
Recommended Citation
Tyavlovsky, Andrei; Zharin, Anatoly; Mikitsevich, Uladzimir; and Vorobey, Roman
(2020)
"SCANNING PHOTOSTIMULATED ELECTROMETRY FOR TESTING THE UNIFORMITY OF SPATIAL DISTRIBUTION OF SEMICONDUCTOR WAFERS PARAMETERS,"
Euroasian Journal of Semiconductors Science and Engineering: Vol. 2
:
Iss.
4
, Article 11.
Available at:
https://uzjournals.edu.uz/semiconductors/vol2/iss4/11
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