The influence of impurities of refractory elements on the inefficiency of charge transfer in charge-coupled devices is investigated. Found that the magnitude of the inefficiency of transfer directly proportional to the density of surface States and the density of surface States in the CCD registers, with the resulting n losses n ≤ 0.1 depends on the type specially introduced impurities. It is shown that in CCD structures doped with impurities Ti, Zr and Hf relative to the control structures, the charge loss is greater, and in doped with impurities W and Mo, the charge loss is less.
Mamadalimov, Abdugafur T. and Daliev, Shakhrukh Kh.
"INFLUENCE OF IMPURITIES OF REFRACTORY ELEMENTS ON THE INEFFICIENCY OF CHARGE TRANSFER IN CHARGED COMMUNICATION DEVICES,"
Euroasian Journal of Semiconductors Science and Engineering: Vol. 1
, Article 2.
Available at: https://uzjournals.edu.uz/semiconductors/vol1/iss2/2