The ellipsometric method refers to polarimetric methods for studying the surface and is intended to measure the thickness of thin films,parameters of thin-film structures and optical surface constants of various materials.This method is based on the effect of a change in the polarization of light upon reflection from the interface between two media.The studied interface is illuminated by polarized light and changes in the ellipse of polarization of the light beam as a result of its reflection are recorded.
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Ergasheva, Muqaddaskhon; Mamajanova, Nilufar; and Ortiqova, Olimakhon
"DETERMINATION OF SURFACE DEFECTS BY ELLIPSOMETRIC METHOD,"
Scientific Bulletin of Namangan State University: Vol. 1
, Article 3.
Available at: https://uzjournals.edu.uz/namdu/vol1/iss8/3