•  
  •  
 

Technical science and innovation

Abstract

The article discusses the assignment system of vacuum coating thickness at spraying it from various devices. The assignment system of vacuum coating thickness deposited onto flat surface substrate from evaporators with the various indicatrix in vacuum working chambers has been evaluated. The application of the developed computer program for the practical evaluation of coating thickness, which allows selecting rational combinations of geometric factors during coating deposition is presented. The obtained results of vacuum deposition of metallic functional coatings are reconciled with the calculated data and enable to preliminarily estimate the degree of uniformity over the thickness of the formed coatings by means of MathCAD program modeling

First Page

41

Last Page

49

References

1. Xoffman D., Singx B., Tomas Dj. Spravochnik po vakuumnoy texnike i texnologiyam. – M.: Texnosfera, 2017. – 520 s. 2. Mayssel D., Gleng R. Texnologiya tonkix plenok. – M.: Sov. radio, 1977. T.1. – 657 s. 3. Smith D.L. Thin-Film Deposition: Principles and Practice. Singapore: McGraw-Hill Co., 1997. – 616 p. 4. Oring M. Materials Science of Thin Films. Deposition and Structure. – London: Academic Press, 2002. – 794 p. 5. Danilin B.S., Dol'skiy V.A., Shinkarenko Yu.L. Poluchenie tonkoplenochnix sloev ravnomernoy tolshini na podlojkax slojnogo profilya // Elektronnaya texnika. Ser.3. Mikroelektronika, 1973. Vip. 6 (46). S. 94–101. 6. Bol'shanin A.F., Jiglinskiy A.G., Parchevskiy S.G., Putilin E.S. Formirovanie plenok postoyannoy velichini na osesimmetrichnoy podlojke // OMP, 2014. № 3. S. 39–42. 7. Kim Chjon Sup, Putilin E.S. Formirovanie tolshini sloev vakuumnim ispareniem // Opticheskiy jurnal, 1998. T. 65. № 10. S. 108–112. 9. Kotlikov Ye.N., Ivanov V.A., Prokashev V.N., Tropin A.N. Ravnomernost' tolshini plenok, osajdennix na vrashayushiesya podlojki. // Opticheskiy jurnal, 2009. T. 76. № 2. S. 58–62. 10. Kuz'michev A.I., Sibul'skiy L.Yu. Modelirovanie osajdeniya plenok pri termova-kuumnom isparenii iz tiglya. // Elektronika i svyaz'. Tematicheskiy vipusk «Elektronika i nanotexnologii», Ch.2. 2009. S. 78-82. Электроника и автоматика, информационные технологии и информационная безопасность 49 11. Sagatelyan G.R., Shishlov A.V. Analiz raspredeleniya tolshini tonkoplenochnogo po-kritiya pri magnetronnom napilenii na ustanovkax s planetarnim peremesheniem podloj-ki. // Nauka i obrazovanie. MGTU im. N.E. Baumana. Elektronniy jurnal, 2014. № 11. DOI: 10.7463/1114.0733662. 12. Kotlikov Ye.N., Ivanov V.A., Prokashev V.N., Tropin A.N. Optimizasiya osnastki vakuumnoy kameri pri izgotovlenii opticheskix pokritiy. // Nauchnoe priborostroenie, 2010. Tom 20. № 1. S. 59–64. 13. Nikonenko V.A. Matematicheskoe modelirovanie texnologicheskix prosessov: Mode-lirovanie v srede MathCAD. / Pod red. G.D. Kuznesova. – M.: MISIS, 2001. – 48 s.

Included in

Engineering Commons

Share

COinS